JOURNAL OF THE ELECTROCHEMICAL SOCIETY Journal

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Ion Pairing, Clustering and Transport in a LiFSI-TMP Electrolyte as Functions of Salt Concentration using Molecular Dynamics Simulations. 168:040511-040511. 2021
Lithiation of Sulfur-Graphene Compounds Using Reactive Force-Field Molecular Dynamics Simulations. 167:100555-100555. 2020
Preface—Mathematical Modeling of Electrochemical Systems at Multiple Scales In Honor of Professor Richard Alkire. 167:010001-010001. 2020
Ab Initio Study of the Interface of the Solid-State Electrolyte Li9N2Cl3 with a Li-Metal Electrode. 166:a2048-a2057. 2019
Simulations of a LiF Solid Electrolyte Interphase Cracking on Silicon Anodes Using Molecular Dynamics. 165:a717-a730. 2018
Isothermal and Cyclic Oxidation of MoAlB in Air from 1100°C to 1400°C. 164:c930-c938. 2017
Mathematical Modeling of Electrochemical Systems at Multiple Scales in Honor of Professor John Newman. 164:y13-y13. 2017
Dynamics of the Lithiation and Sodiation of Silicon Allotropes: From the Bulk to the Surface. 164:a1644-a1650. 2017
Insights into the Li Intercalation and SEI Formation on LiSi Nanoclusters. 164:e3457-e3464. 2017
Ion Diffusivity through the Solid Electrolyte Interphase in Lithium-Ion Batteries. 164:e3159-e3170. 2017
Ethylene Carbonate Reduction on Lithiated Surfaces of Hydroxylated Amorphous Silicon Dioxide. 163:a2197-a2202. 2016
Influence of Applied Voltages on Mechanical Properties and In-Vitro Performances of Electroplated Hydroxyapatite Coatings on Pure Titanium. 163:d305-d308. 2016
Towards Next Generation Lithium-Sulfur Batteries: Non-Conventional Carbon Compartments/Sulfur Electrodes and Multi-Scale Analysis. 163:a730-a741. 2016
Electrochemical Impedance Spectroscopy Optimization on Passive Metals. 163:c470-c476. 2016
Origin of Excess Irreversible Capacity in Lithium-Ion Batteries Based on Carbon Nanostructures. 162:a2106-a2115. 2015
Trapping Polysulfides Catholyte in Carbon Nanofiber Sponges for Improving the Performances of Sulfur Batteries. 162:a1396-a1400. 2015
Erratum: Dynamic Mechanical Analysis of Phase Transformations and Anelastic Relaxation in Stabilized Zirconias [J. Electrochem. Soc., 162, F14 (2015)]. 162:x9-x9. 2015
Dynamic Characterization of Dendrite Deposition and Growth in Li-Surface by Electrochemical Impedance Spectroscopy. 162:a687-a696. 2015
Dynamic Mechanical Analysis of Phase Transformations and Anelastic Relaxation in Stabilized Zirconias. 162:f14-f22. 2015
Enhanced-Ion Transfer via Metallic-Nanopore Electrodes. 161:a1475-a1479. 2014
Mathematical Modeling of Electrochemical Systems at Multiple Scales. 161:y9-y9. 2014
DFT Study of Reduction Mechanisms of Ethylene Carbonate and Fluoroethylene Carbonate on Li+-Adsorbed Si Clusters. 161:e3097-e3109. 2014
Interfacial Characterization of Single- and Multi-Walled CNT-Doped Chitosan Scaffolds under Two Flow Conditions. 161:h751-h761. 2014
Modeling Electrochemical Decomposition of Fluoroethylene Carbonate on Silicon Anode Surfaces in Lithium Ion Batteries. 161:a213-a221. 2014
Engineering the Abio-Bio Interface to Enable More than Moore in Functional Bioelectronics. 160:b60-b65. 2013
In Situ Spectroscopic Measurements of Individual Cation and Anion Dynamics in a RuO2 Electrochemical Capacitor. 160:a862-a868. 2013
A Voltammetry Study of Ethanol Oxidation on Carbon Supported, Non Alloyed Platinum-Tungsten Catalysts. 160:h185-h191. 2013
Charge Trapping and Detrapping in nc-RuO Embedded ZrHfO High-k Thin Film for Nonvolatile Memory Applications. 159:h214-h219. 2012
Concurrent Reaction and Plasticity during Initial Lithiation of Crystalline Silicon in Lithium-Ion Batteries. 159:a238-a243. 2012
Memory Functions of Nanocrystalline ITO Embedded Zirconium-Doped Hafnium Oxide High-k Capacitor with ITO Gate. 159:h595-h598. 2012
Publisher's Note: Long-Term Oxidation of Ti2AlC in Air and Water Vapor at 1000–1300°C Temperature Range [J. Electrochem. Soc., 159, C90 (2012)]. 159:s9-s9. 2012
Hybrid DFT Functional-Based Static and Molecular Dynamics Studies of Excess Electron in Liquid Ethylene Carbonate. 158:a400-a410. 2011
Long-Term Oxidation of Ti2AlC in Air and Water Vapor at 1000–1300°C Temperature Range. 159:c90-c96. 2011
Ruthenium Modified Zr-Doped HfO2 High-k Thin Films with Low Equivalent Oxide Thickness. 158:g162-g168. 2011
Single- and Dual-Layer Nanocrystalline Indium Tin Oxide Embedded ZrHfO High-k Films for Nonvolatile Memories – Material and Electrical Properties. 158:h756-h762. 2011
Evaluation of Fluorine Ion Concentration in TiO2 NT Anodization Process. 157:k125-k130. 2010
Numerical Investigation of Mechanical Durability in Polymer Electrolyte Membrane Fuel Cells. 157:b705-b713. 2010
Role of Iridium in Pt-based Alloy Catalysts for the ORR: Surface Adsorption and Stabilization Studies. 157:b959-b963. 2010
Electromigration of Flat and Bent Copper Lines Patterned with a Plasma-Based Etch Process. 156:h579-h584. 2009
Additive-Gas Effects on Cl2 Plasma-Based Copper-Etch Process and Sidewall Attack. 155:h97-h102. 2008
Grain-Size Effect on a Plasma-Based Copper Etch Process. 155:h432-h437. 2008
Nanocrystalline Zinc-Oxide-Embedded Zirconium-Doped Hafnium Oxide for Nonvolatile Memories. 155:h386-h389. 2008
An Isothermal Annealing Study of Spontaneous Morphology Change in Electrodeposited Copper Metallization. 154:d103-d112. 2007
Memory Functions of Nanocrystalline Indium Tin Oxide Embedded Zirconium-Doped Hafnium Oxide MOS Capacitors. 154:h887-h893. 2007
Reactive Ion Etching of Titanium Tungsten Thin Films. 154:h653-h658. 2007
Hafnium-Doped Tantalum Oxide High-k Gate Dielectrics. 153:g410-g416. 2006
Ab Initio and Classical Molecular Dynamics Studies of the Dilithium Phthalocyanine/Pyrite Interfacial Structure. 152:a1955-a1962. 2005
Evaluation of Nontoxic Polymer Coatings with Potential Biofoul Release Properties Using EIS. 152:b236-B243. 2005
Influence of a 5 Å Tantalum Nitride Interface Layer on Dielectric Properties of Zirconium-Doped Tantalum Oxide High-k Films. 152:g617-g622. 2005
Zirconium-Doped Tantalum Oxide Gate Dielectric Films Integrated with Molybdenum, Molybdenum Nitride, and Tungsten Nitride Gate Electrodes. 152:g643-g650. 2005
Composite Cathode with Li[sub 2]Pc. 151:a1338-A1338. 2004
Electrical and Physical Characterization of Zirconium-Doped Tantalum Oxide Thin Films. 151:f59-f67. 2004
Long Time Oxidation Study of Ti[sub 3]SiC[sub 2], Ti[sub 3]SiC[sub 2]/SiC, and Ti[sub 3]SiC[sub 2]/TiC Composites in Air. 150:b166-B166. 2003
Effect of Sample Configuration on AMTEC Electrode/Electrolyte Characteristics Measurements in a Sodium Exposure Test Cell. 149:a1432-A1436. 2002
Investigation of Wells-Dawson Heteropoly Oxofluorotungstates by Scanning Tunneling Microscopy and Tunneling Spectroscopy. 149:e117-E124. 2002
Chlorine Plasma/Copper Reaction in a New Copper Dry Etching Process. 148:g524-G529. 2001
Molecular Dynamics Study of Graphite/Electrolyte Interfaces. 148:a624-A624. 2001
A Lattice‐Gas Model Study of Lithium Intercalation in Graphite. 146:3630-3638. 1999
Theoretical Studies of Lithium Perchlorate in Ethylene Carbonate, Propylene Carbonate, and Their Mixtures. 146:3613-3622. 1999
High Temperature Reactive Ion Etching of Indium‐Tin Oxide with HBr and CH 4 Mixtures. 145:4313-4317. 1998
Computational Studies of Lithium Intercalation in Model Graphite in the Presence of Tetrahydrofuran. 145:3328-3334. 1998
High Temperature Reactive Ion Etching of Indium‐Tin Oxide. 144:1411-1416. 1997
Horizontally Redundant, Split‐Gate a‐Si:H Thin Film Transistors. 143:2680-2682. 1996
Nonphotosensitive, Vertically Redundant Two‐Channel a‐Si:H Thin Film Transistor. 143:1469-1471. 1996
Titanium Nitridation on Copper Surfaces. 143:2349-2353. 1996
Plasma Etching and Deposition for a‐Si:H Thin Film Transistors. 142:2486-2507. 1995
PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device Performance. 142:186-190. 1995
Thin Film Transistors with Graded SiN x Gate Dielectrics. 141:1061-1065. 1994
Reactive Ion Etch Processes for Amorphous Silicon Thin Film Transistors A Based Chemistry. 141:502-506. 1994
The Role of Gas‐Phase Reactions in Modeling of the Forced‐Flow Chemical Vapor Infiltration Process. 140:2121-2124. 1993
A Self‐aligned, Trilayer, a‐Si:H Thin Film Transistor Prepared from Two Photomasks. 139:1199-1204. 1992
Reactive Ion Etching of PECVD n+ a‐Si:H Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation. 139:548-552. 1992
Reactive Ion Etching of Sputter Deposited Tantalum Oxide and Its Etch Selectivity to Tantalum. 139:579-583. 1992
A New Process Using Two Photo‐Masks to Prepare Trilayer Thin Film Transistors. 138:637-638. 1991
Factors Affecting the Molybdenum Line Slope by Reactive Ion Etching. 137:1907-1911. 1990
Reactive Ion Etching of PECVD Amorphous Silicon and Silicon Nitride Thin Films with Fluorocarbon Gases. 137:1235-1239. 1990
The Effect of a High Voltage Corona‐Discharge on Electroactive Pt‐Polymer Composites. 134:2802-2804. 1987
Structural and Thermodynamic Properties of Cointercalated Titanium Disulfide. 133:1966-1970. 1986
RUTHERFORD ION BACKSCATTERING STUDIES OF ANION-DOPED ANODIC FILMS. 133:C94-C94. 1986
The Extent of the Phenomenon of Oscillatory Anion Incorporation in Alumina Barrier Films. 132:3065-3066. 1985
Analysis of InP Surface Prepared by Various Cleaning Methods. 129:447-448. 1982
Auger Electron Spectroscopy Study of GaAs Substrate Cleaning Procedures. 129:406-408. 1982
Electrodissolution Kinetics of Nickel in Concentrated Acidic Chloride Solutions. 126:1118-1123. 1979
ULTRATRACE ANALYSIS OF LIGHT ELEMENTS USING CHARGED PARTICLE ACTIVATION APPLICATION TO DETERMINATION OF OXYGEN IN SILICON. 115:C249-&. 1968