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- Cluster ion Implantation: A New Approach to Ultra-Shallow Junction in Silicon. Journal of Vacuum Science and Technology Part B: Nanotechnology and Microelectronics. 20. 2002
- Defect Engineering: A New Approach on Ultra-Shallow Junction in Silicon. Journal of Vacuum Science and Technology Part B: Nanotechnology and Microelectronics. 20. 2002
- Gas temperature measurements in weakly ionized glow discharge with filtered Rayleigh scattering 2002
- Modeling of discharges generated by electron beams in dense gases: Fountain and thunderstorm regimes. Physics of Plasmas. 8:1518-1528. 2001
- Initial operation of a largescale plasma source ion implantation experiment. Journal of Vacuum Science and Technology Part B: Nanotechnology and Microelectronics. 12:870-874. 1994
- Department of Mechanical & Aerospace Engineering 1990
- QSWITCHED LASER WITH CONTROLLABLE PULSE LENGTH. Applied Physics Letters. 18:129-130. 1971
- Discrete dislocation analysis of size effects in thin films. Journal of Applied Physics. 93:5920-5928.
- Discussion on The Second Law and Energy. AIP Conference Proceedings. 374-380. 2008
- Velocity, vorticity, and structurethe present state of laser diagnostics in highspeed (unseeded) air. AIP Conference Proceedings. 24-33. 1990