Initial operation of a largescale plasma source ion implantation experiment
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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Wood, B. P., Henins, I., Gribble, R. J., Reass, W. A., Faehl, R. J., Nastasi, M. A., & Rej, D. J.
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Wood, BP||Henins, I||Gribble, RJ||Reass, WA||Faehl, RJ||Nastasi, MA||Rej, DJ
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http://dx.doi.org/10.1116/1.587362