(Invited) Plasma-Based Thin Film Technology in Fabrication of Nano- to Giga-Sized Electronics

This talk is presented to honor Professor Noel Buckley who has made many important contributions in compound semiconductors, copper thin film deposition, batteries, and other topics critical to the manufacture of modern optoelectronics. He is also a good friend, colleague, and collaborator for 3 decades. Plasma technology has been broadly used in the mass production of modern electronics varying from nano-sized devices in ICs to giga-dimension flat panel displays. It is especially critical to the preparation of thin films with well-controlled properties, geometry, and reliability. In this talk, the speaker shall discuss the recent development of plasma thin film deposition, etching, and reaction in his laboratory for the manufacture of electronic and optoelectronic products. Room-temperature plasma-based copper etch processes for sub 0.5 m geometry patterns ICs and large-area direct-view TFT LCDs Sputter deposited sub 1 nm EOT high-k gate dielectrics, nanocrystals embedded high-k dielectric nonvolatile memories, and solid-state incandescent light emitting devices (SSI-LEDs) Plasma oxidation of copper as a self-aligned passivation film

(Invited) Plasma-Based Thin Film Technology in Fabrication of Nano- to Giga-Sized Electronics Academic Article