EFFECTS OF INTERFACIAL CHARGES ON DOPED AND UNDOPED HfOx STACK LAYER WITH TIN METAL GATE ELECTRODE FOR NANO-SCALED CMOS GENERATION Academic Article uri icon

published proceedings

  • JOURNAL OF NANO- AND ELECTRONIC PHYSICS

author list (cited authors)

  • Chatterjee, S., & Kuo, Y.

complete list of authors

  • Chatterjee, S||Kuo, Y

publication date

  • January 2011