publication venue for Effects of interfacial charges on doped and undoped Hfo x stack layer with TiN metal gate electrode for nano-scaled CMOS generation. 3:162-169. 2011 EFFECTS OF INTERFACIAL CHARGES ON DOPED AND UNDOPED HfOx STACK LAYER WITH TIN METAL GATE ELECTRODE FOR NANO-SCALED CMOS GENERATION. 3:162-169. 2011
