Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns Academic Article uri icon

published proceedings

  • JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

altmetric score

  • 7

author list (cited authors)

  • Li, W., Wu, W., & Williams, R. S.

citation count

  • 83

complete list of authors

  • Li, Wen-Di||Wu, Wei||Williams, Robert Stanley

publication date

  • November 2012