Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns Academic Article uri icon

published proceedings

  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

altmetric score

  • 7

author list (cited authors)

  • Li, W., Wu, W., & Stanley Williams, R.

citation count

  • 78

complete list of authors

  • Li, Wen-Di||Wu, Wei||Stanley Williams, Richard

publication date

  • November 2012