Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns
-
- Overview
-
- Research
-
- Identity
-
- Additional Document Info
-
- Other
-
- View All
-
Overview
published proceedings
-
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
altmetric score
author list (cited authors)
-
Li, W., Wu, W., & Williams, R. S.
citation count
complete list of authors
-
Li, Wen-Di||Wu, Wei||Williams, Robert Stanley
publication date
publisher
published in
Research
keywords
-
Bioengineering
-
Nanotechnology
Identity
Digital Object Identifier (DOI)
Additional Document Info
start page
end page
volume
issue
Other
URL
-
http://dx.doi.org/10.1116/1.4758768