Simplified manufacturable band edge metal gate solution for NMOS without a capping layer Conference Paper uri icon


  • We describe an NMOS band edge solution that uses a metal gate doped with Lanthanide elements to achieve work functions as low as 4.05eV The capping interlayers used in previous works are no longer necessary, and metal gate implementation became much simpler. Using this electrode, low Vth value and high mobility suitable for high performance devices are achieved at a practical EOT 0f 8.

name of conference

  • 2006 International Electron Devices Meeting

published proceedings

  • 2006 International Electron Devices Meeting

altmetric score

  • 6

author list (cited authors)

  • Harris, H. R., Alshareef, H., Wen, H. C., Krishnan, S., Choi, K., Luan, H., ... Jammy, R.

citation count

  • 7

complete list of authors

  • Harris, HR||Alshareef, H||Wen, HC||Krishnan, S||Choi, K||Luan, H||Heh, D||Park, CS||Park, HB||Hussain, M||Ju, BS||Kirsch, PD||Song, SC||Majhi, P||Lee, BH||Jammy, R

publication date

  • January 2006