Status Review of Nanocrystals Embedded High-K Nonvolatile Memories Conference Paper uri icon

abstract

  • Nonvolatile memories including high-k dielectric materials are important for future ULSICs. Among several possible structures, the nanocrystals embedded high-k gate dielectric is popular because of the simple fabrication process, versatility in selecting composing materials, good device characteristics and reliability. In this paper, critical issues on the nanocrystals embedded ZrHfO high-k MOS memory capacitors are reviewed and discussed.

published proceedings

  • ECS Transactions

author list (cited authors)

  • Kuo, Y.

citation count

  • 5

complete list of authors

  • Kuo, Yue

publication date

  • April 2011