MOSFETs and TFTs are key semiconductor devices in the two largest semiconductor industries nowadays. The development of the former follows the Moores Law in shrinking of the size to the nano scale. The advancement of the latter is toward the high density, large area array. They are operated based on the same principle and facing common challenges. The success is dependent on the thorough understanding of material properties, fabrication processes, and device physics. The author reviews two sets of critical works developed in his laboratory, i.e., plasma thin film technology and high-
kthin films for electronics and optoelectronics.