Line-edge-roughness characterization of photomask patterns and lithography-printed patterns
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Wang, Z., Lin, P., Nguyen, P., Wang, J., & Lee, C.
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Wang, Zhikun||Lin, Pengfei||Nguyen, Phuc||Wang, Jingyan||Lee, ChaBum
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40 Engineering
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4014 Manufacturing Engineering
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http://dx.doi.org/10.1016/j.precisioneng.2024.02.006