Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer‐based positive‐tone photoresist materials Academic Article uri icon

abstract

  • © 2014 Wiley Periodicals, Inc. The reported diblock brush terpolymer displays the fundamental advantages of high macromolecular and regiochemical control in simultaneous top-down/bottom-up construction of advanced positive-tone photoresist materials. By selective partition the substrate adhesion, surface-active migration, and chemically-reactive deblocking functional compositions into the cylindrical polymer brush architectures, large-areas of vertical alignment of the polymers within thin films are realized. The bottom-up premeditated system enables effective top-down lithography to produce near-molecular pixel resolution (2-3 molecules) at low operation dosage.

author list (cited authors)

  • Sun, G., Cho, S., Yang, F., He, X., Pavía‐Sanders, A., Clark, C., ... Wooley, K. L.

citation count

  • 9

publication date

  • August 2014

publisher