Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation Academic Article uri icon

abstract

  • Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 1017 N cm2 min1 over an area of <100 cm2 and with acceleration energies of 1050 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of 1.7 1017 N cm2 min1 at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation.

published proceedings

  • Journal of Materials Research

author list (cited authors)

  • Falkenstein, Z., Walter, K. C., Nastasi, M. A., Rej, D. J., & Gavrilov, N. V.

citation count

  • 2

complete list of authors

  • Falkenstein, Zoran||Walter, Kevin C||Nastasi, Michael A||Rej, Donald J||Gavrilov, Nikolai V

publication date

  • November 1999