Nanofabrication module integrated with optical aligner Academic Article uri icon

abstract

  • In this article, we describe a simple module that can be integrated with a commercial optical aligner for nanoimprint lithography or optical lithography. The module provides a convenient low-cost technique to transform an optical aligner for microfabrication into a nanofabrication machine. This combination enables the creation of nanoscale features and alignment of multiple-layer lithographic patterns with submicron accuracy within one instrument. Imprinting of 30 nm half-pitch lines has been demonstrated by the module, as well as submicron alignment. The module has also been used to fabricate micro- and nanoscale patterns simultaneously by the combination of optical and imprint lithography.

published proceedings

  • JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

author list (cited authors)

  • Stuart, C., Xu, Q. F., Tseng, R. J., Yang, Y., Hahn, H. T., Chen, Y., Wu, W., & Williams, R. S.

citation count

  • 6

complete list of authors

  • Stuart, C||Xu, QF||Tseng, RJ||Yang, Y||Hahn, HT||Chen, Y||Wu, W||Williams, RS

publication date

  • March 2006