THEORETICAL STUDY OF THE ETCHBACK PLANARIZATION PROCESS. Conference Paper uri icon

abstract

  • A computer modeling method was used to study various factors such as the etch time, the degree of planarization of the sacrificial layer, the original surface shape of the sacrificial layer, the etch ratio, and the original oxide step shape, that directly affect the topography of an etchback planarized surface.

author list (cited authors)

  • Kuo, Y.

publication date

  • December 1987