Critical plasma process issues in the fabrication of thin film transistor liquid crystal displays Conference Paper

abstract

• Plasma technology plays a key role in the mass production of thin film transistor (TFT) array. The technology directly affects the performance, reliability, and yield of the a-Si:H TFT array. In addition, the major advantage of plasma technology over other conventional thin film technology lies in the following three basic mass production requirements: low temperature, large area, and high throughput.

name of conference

• 25th Anniversary, IEEE Conference Record - Abstracts. 1998 IEEE International Conference on Plasma Science (Cat. No.98CH36221)

authors

• Kuo, Yue

published proceedings

• 2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)

author list (cited authors)

• Kuo, Y.

citation count

• 0

complete list of authors

• Kuo, Yue

publication date

• January 1998

publisher

• Institute of Electrical and Electronics Engineers (IEEE)  Publisher

published in

• IEEE International Conference on Plasma Science  Journal

keywords

• 40 Engineering
• 4016 Materials Engineering

Digital Object Identifier (DOI)

• 10.1109/plasma.1998.677714

start page

• 213

URL

• http://dx.doi.org/10.1109/plasma.1998.677714