Layout modification for library cell Alt-PSM composability
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In sub-wavelength lithography, light field Alt-PSM (Alternating Phase Shifting Mask) is an essential technology for poly layer printability. In a standard cell based design, the problem of obtaining Alt-PSM compliance for an individual cell layout has been solved well. However, placing Alt-PSM compliant cells together can not guarantee Alt-PSM compliance of the entire chip/block layout due to phase interactions among adjacent cells. A simple solution to this Alt-PSM composability problem is to wrap blank area around each cell, which is very inefficient on chip area usage. In this paper, we formulate the composability problem as a graph model and propose a polynomial time optimal algorithm to achieve Alt-PSM composability with the least impact on cell layout.
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Design and Process Integration for Microelectronic Manufacturing II
DESIGN AND PROCESS INTEGRATION FOR MICROELECTRONIC MANUFACTURING II
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Cao, K., Hu, J., & Cheng, M.
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