Layout modification for library cell Alt-PSM composability Conference Paper uri icon

abstract

  • In sub-wavelength lithography, light field Alt-PSM (Alternating Phase Shifting Mask) is an essential technology for poly layer printability. In a standard cell based design, the problem of obtaining Alt-PSM compliance for an individual cell layout has been solved well. However, placing Alt-PSM compliant cells together can not guarantee Alt-PSM compliance of the entire chip/block layout due to phase interactions among adjacent cells. A simple solution to this Alt-PSM composability problem is to wrap blank area around each cell, which is very inefficient on chip area usage. In this paper, we formulate the composability problem as a graph model and propose a polynomial time optimal algorithm to achieve Alt-PSM composability with the least impact on cell layout.

name of conference

  • Microlithography 2004

published proceedings

  • SPIE Proceedings

author list (cited authors)

  • Cao, K. e., Hu, J., & Cheng, M.

citation count

  • 5

complete list of authors

  • Cao, Ke||Hu, Jiang||Cheng, Mosong

editor list (cited editors)

  • Liebmann, L. W.

publication date

  • May 2004

publisher