CF-252-PARTICLE DESORPTION MASS-SPECTROMETRY IN A DEPTH PROFILING MODE Academic Article

abstract

• This paper discusses a novel application of Particle Desorption Mass Spectrometry for surface characterization. The first results obtained by combining 252Cf-PDMS with keV ion sputtering for depth profiling analysis are presented. The PDMS depth profile of a 4660 layer of Al on Si was corroborated by XPS depth profiling and indicates an information depth for PDMS of 1 to 3 monolayers. 1988.

authors

• Schweikert, Emile

published proceedings

• NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

author list (cited authors)

• SUMMERS, W. R., MCAFEE, C. D., & SCHWEIKERT, E. A.

citation count

• 8

complete list of authors

• SUMMERS, WR||MCAFEE, CD||SCHWEIKERT, EA

publication date

• July 1988

publisher

• Elsevier  Publisher

published in

• Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms  Journal

keywords

• 51 Physical Sciences
• 5104 Condensed Matter Physics
• 5106 Nuclear And Plasma Physics
• Biotechnology

Digital Object Identifier (DOI)

• 10.1016/0168-583X(88)90369-2

start page

• 89

end page

• 96

volume

• 34

issue

• 1

URL

• http%3A%2F%2Fdx.doi.org%2F10.1016%2F0168-583x%2888%2990369-2