Linear motor-leviated stage for photolithography Academic Article uri icon

abstract

  • This paper presents a linear-motor-levitated stage with large planar motion capability. This positioning system is the first capable of providing all the motions required for photolithography in semiconductor manufacturing with only a single moving part. The single moving part generates all six-degree-of-freedom (6-DOF) motions required for focusing and alignment, and large two-dimensional motions (50 × 50 mm) for positioning. Four linear permanent-magnet motors produce suspension forces to support the moving part (5.58 kg) as well as driving forces. The stage is to have tens-of-nanometer position stability and the design can be readily scaled to accommodate 12-inch wafers in the next generation of photolithography. The prototype stage is being levitated in initial testing. Mechatronic, Precision, Actuator.

author list (cited authors)

  • Kim, W. J., & Trumper, D. L.

publication date

  • January 1997