Phase transformations in sputtered Ni–Mn–Ga magnetic shape memory alloy thin films
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Ni-Mn-Ga magnetic shape memory alloy films have been prepared by the DC magnetron sputtering technique. As-deposited films show a quasi-amorphous structure that crystallizes at ∼ 500 K. Crystallization study using Kissinger's analysis reveals a relatively low activation energy indicating partial crystallinity in the films. In situ X-ray diffraction studies show reversible martensite phase transformations, and phase segregation to non-transforming L1 2 precipitates at higher temperatures. It was observed that the phase segregation can be suppressed by low temperature heat treatment. © 2011 Elsevier B.V. All rights reserved.
author list (cited authors)
Jetta, N., Ozdemir, N., Rios, S., Bufford, D., Karaman, I., & Zhang, X.