Dip-pen nanolithography of chemical templates on silicon oxide Academic Article

abstract

• A flexible template strategy for the generation of nanometerscale templates via dippen nanolithography is described. Trichlorosilanes are patterned with a chemically modified cantilever, and subsequently oxidized. The reactive template formed can be further modified by covalent attachment (e.g., of poly(ethylene imine), see Figure) or via electrostatic immobilization (e.g., of CdSe).

authors

• Baker, Lane

published proceedings

• ADVANCED MATERIALS

author list (cited authors)

• Kooi, S. E., Baker, L. A., Sheehan, P. E., & Whitman, L. J.

complete list of authors

• Kooi, SE||Baker, LA||Sheehan, PE||Whitman, LJ

publication date

• June 2004

publisher

• Wiley  Publisher

published in

• ADVANCED MATERIALS  Journal

keywords

• 40 Engineering
• 4016 Materials Engineering
• 4018 Nanotechnology

Digital Object Identifier (DOI)

• 10.1002/adma.200306468

start page

• 1013

end page

• +

volume

• 16

issue

• 12

URL

• http://dx.doi.org/10.1002/adma.200306468