On the inelastic behavior of crystalline silicon at elevated temperatures

abstract

• The broad focus of this paper is on developing continuum models of inelastic response of crystalline materials that include the influence of microstructure, material symmetry, and dissipation of energy accompanying the changes in the microstructure. A framework has been developed, built on the idea of natural configurations of a material, that has provisions for explicit treatment of material microstructure (slip planes, dislocations, interfaces, etc.). It is demonstrated that the developed framework is applicable to diverse phenomena such as plasticity due to slip and twinning, and martensitic phase transformations. The developed framework is used to study the inelastic behavior of crystalline silicon at elevated temperatures. 2001 Elsevier Science Ltd.

authors

• Reddy, Junuthula

published proceedings

• JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS

author list (cited authors)

• Rengarajan, G., & Reddy, J. N.

citation count

• 2

complete list of authors

• Rengarajan, G||Reddy, JN

publication date

• August 2001

publisher

• Elsevier  Publisher

published in

• Journal of the Mechanics and Physics of Solids  Journal

keywords

• Constitutive Model
• Crystal Plasticity
• Inelasticity
• Silicon

Digital Object Identifier (DOI)

• 10.1016/S0022-5096(01)00015-1

start page

• 1665

end page

• 1700

volume

• 49

issue

• 8

URL

• http://dx.doi.org/10.1016/s0022-5096(01)00015-1