Cu, Mo-doped and pristine-BiVO4 thin films prepared by rf sputtering process for photocatalytic applications
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JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
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Merupo, V. I., Velumani, S., Abramova, A., Ordon, K., Makowska-Janusik, M., & Kassiba, A.
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Merupo, VI||Velumani, S||Abramova, A||Ordon, K||Makowska-Janusik, M||Kassiba, A
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40 Engineering
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4004 Chemical Engineering
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4016 Materials Engineering
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http://dx.doi.org/10.1007/s10854-018-9241-7