Nanostructured Thin Films of OrganicOrganometallic Block Copolymers: OneStep Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching Academic Article uri icon

published proceedings

  • Advanced Materials

author list (cited authors)

  • Lammertink, R., Hempenius, M. A., van den Enk, J. E., Chan, V. Z., Thomas, E. L., & Vancso, G. J.

citation count

  • 157

complete list of authors

  • Lammertink, RGH||Hempenius, MA||van den Enk, JE||Chan, V Z‐H||Thomas, EL||Vancso, GJ

publication date

  • January 2000

publisher