Nanostructured Thin Films of OrganicOrganometallic Block Copolymers: OneStep Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching
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Lammertink, R., Hempenius, M. A., van den Enk, J. E., Chan, V. Z., Thomas, E. L., & Vancso, G. J.
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Lammertink, RGH||Hempenius, MA||van den Enk, JE||Chan, V Z‐H||Thomas, EL||Vancso, GJ
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34 Chemical Sciences
40 Engineering
4016 Materials Engineering
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http://dx.doi.org/10.1002/(sici)1521-4095(200001)12:2%3C98::aid-adma98%3E3.0.co;2-5