Poly(ferrocenyldimethylsilanes) for reactive ion etch barrier applications
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Lammertink, R., Hempenius, M. A., Chan, V., Thomas, E. L., & Vancso, G. J.
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Lammertink, RGH||Hempenius, MA||Chan, VZH||Thomas, EL||Vancso, GJ
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http://dx.doi.org/10.1021/cm001052q