Si-containing block copolymers for self-assembled nanolithography Academic Article

authors

• Thomas, Edwin

published proceedings

• JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

altmetric score

• 3

author list (cited authors)

• Ross, C. A., Jung, Y. S., Chuang, V. P., Ilievski, F., Yang, J., Bita, I., ... Cheng, J. Y.

citation count

• 78

complete list of authors

• Ross, CA||Jung, YS||Chuang, VP||Ilievski, F||Yang, JKW||Bita, I||Thomas, EL||Smith, Henry I||Berggren, KK||Vancso, GJ||Cheng, JY

publication date

• November 2008

publisher

• American Vacuum Society  Publisher

published in

• Journal of Vacuum Science and Technology Part B: Nanotechnology and Microelectronics  Journal

keywords

• Etching
• Nanolithography
• Nanopatterning
• Polymer Blends
• Polymer Films
• Self-assembly
• Silicon Compounds

Digital Object Identifier (DOI)

• 10.1116/1.2981079

start page

• 2489

end page

• 2494

volume

• 26

issue

• 6

URL

• http://dx.doi.org/10.1116/1.2981079