Method and apparatus for remotely monitoring properties of gases and plasmas
Patent
Overview
Overview
abstract
A method and apparatus for remotely monitoring properties of gases and plasmas is disclosed. A laser beam is focused at a desired region within a gas or plasma to be analyzed, generating an ionized sample region in the gas or plasma. A beam of microwave radiation is directed toward the ionized sample region, and a portion of the microwave radiation is scattered by the ionized sample region and Doppler-shifted in frequency. The scattered, frequency-shifted microwave radiation is received by a microwave receiver, and is processed by a microwave detection system to determine properties of the gas or plasma, including velocities, temperatures, concentrations of molecular species, and other properties of the gas or plasma.
