Plasma Treatment and Plasma Enhanced Chemical Vapor Deposition onto Temperature Sensitive Biological Materials Patent uri icon

abstract

  • A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.

author list (cited authors)

  • Staack, D., & Tsai, T.

publication date

  • July 2016