Minimal contact edge ring for rapid thermal processing Patent uri icon


  • Embodiments of the disclosure generally relate to a support ring that supports a substrate in a process chamber. In one embodiment, the support ring comprises an inner ring, an outer ring connecting to an outer perimeter of the inner ring through a flat portion, an edge lip extending radially inwardly from an inner perimeter of the inner ring to form a supporting ledge, and a substrate support extending upwardly from a top surface of the edge lip. The substrate support may be a continuous ring-shaped body disposed around a circumference of the edge lip. The substrate support supports a substrate about its entire periphery from the back side with minimized contact surface to thermally disconnect the substrate from the edge lip. Particularly, the substrate support provides a substantial line contact with the back surface of the substrate.

author list (cited authors)

  • Pan, H., Tallavarjula, S., Bautista, K. J., & Tobin, J.

complete list of authors

  • Pan, Heng||Tallavarjula, Sairaju||Bautista, Kevin J||Tobin, Jeffrey

publication date

  • January 2017