Minimal contact edge ring for rapid thermal processing Patent uri icon


  • Embodiments of the present invention generally relate to a support ring for supporting a substrate during thermal processing in a process chamber. The support ring generally includes a ring body, an outer rib extending from a first surface of the ring body, a midrib extending from the first surface of the ring body, and a substrate support extending from a second surface of the ring body. The support ring reduces thermal coupling between a substrate and the support ring.

author list (cited authors)

  • Pan, H., & Bautista, K. J.

complete list of authors

  • Pan, Heng||Bautista, Kevin J

publication date

  • September 2017