A two-step annealing of shallow junctions formed by GeB cluster ion implantation of Si
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The CAARI 2000: Sixteenth international conference on the application of accelerators in research and industry
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AIP Conference Proceedings
author list (cited authors)
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Lu, X., Shao, L., Jin, J., Wang, X., Chen, Q. Y., Liu, J., Ling, P., & Chu, W.
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Lu, Xinming||Shao, Lin||Jin, Jianyue||Wang, Xuemei||Chen, QY||Liu, Jiarui||Ling, Peiching||Chu, Wei-Kan
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http://dx.doi.org/10.1063/1.1395469