Ion-induced amorphous and crystalline phase formation in Al/Ni, Al/Pd, and Al/Pt thin films Academic Article

abstract

• Amorphization by ion beam irradiation of multilayered samples of Al/Pt, Al/Pd, and Al/Ni has been investigated by selected area diffraction and Rutherford backscattering. With a dose of 21014 Xe ions/cm2, uniform mixing is achieved in the Al/Pt system and the amorphous phase is produced over a large composition range. In the Al/Pd and Al/Ni systems, amorphous phases or the equilibrium, crystalline phases are formed depending on the composition of the films. The same results were found when the samples were annealed to form crystalline phases before bombardment. For thin films of these fcc metals, only the simplest intermetallics, NiAl and PdAl, (primitive cubic structures with 2 atoms/cell) were formed in crystalline form by ion-beam irradiation.

authors

• Nastasi, Michael

published proceedings

• Applied Physics Letters

author list (cited authors)

• Hung, L. S., Nastasi, M., Gyulai, J., & Mayer, J. W.

citation count

• 201

publication date

• April 1983

publisher

• AIP Publishing  Publisher

keywords

• 40 Engineering
• 4016 Materials Engineering
• 51 Physical Sciences

Digital Object Identifier (DOI)

• 10.1063/1.94068

start page

• 672

end page

• 674

volume

• 42

issue

• 8

URL

• http://dx.doi.org/10.1063/1.94068