Stability Of Thin Film Amorphous Metal Alloys Academic Article uri icon

abstract

  • ABSTRACTThermal stability of self supporting amorphous films is reviewed in terms of a simple kinetic model. A semi-empirical relationship between the crystallization temperature and the heat of hole formation is applicable only for systems with negative heat of mixing.Interaction of amorphous diffusion barriers with Si substrates and Al overlayers is also reviewed for near noble-refractory alloys. If their crystallization temperature is higher than their reaction temperature, there is no correlation between the two parameters. The reaction takes place when the annealing temperature reaches a value at which compounds can be formed of both constituents of the alloy. Finally, comparison is made to reactions of crystalline alloys with Si.

published proceedings

  • MRS Advances

altmetric score

  • 3

author list (cited authors)

  • Saris, F. W., Hung, L. S., Nastasi, M., & Mayer, J. W.

citation count

  • 2

complete list of authors

  • Saris, FW||Hung, LS||Nastasi, M||Mayer, JW

publication date

  • January 1985