Method of transferring a thin crystalline semiconductor layer Patent

abstract

• A method for transferring a monocrystalline, thin layer from a first substrate onto a second substrate involves deposition of a doped semiconductor layer on a substrate and epitaxial growth of a thin, monocrystalline, semiconductor layer on the doped layer. After bonding the thin epitaxial monocrystalline semiconductor layer to a second substrate, hydrogen is introduced into the doped layer, and the thin layer is cleaved and transferred to the second substrate, with the cleaving controlled to happen at the doped layer.

authors

• Nastasi, Michael

author list (cited authors)

• Nastasi, M., Shao, l., Thompson, P. E., Lau, S. S., Theodore, N. D., Alford, T. L., & Mayer, J. W.

complete list of authors

• Nastasi, Michael||Shao, lin||Thompson, Philip E||Lau, Silvanus S||Theodore, N David||Alford, Terry L||Mayer, James W

publication date

• November 2006