Mechanisms for ion-irradiation-induced relaxation of stress in mosaic structured Cu thin films Academic Article

abstract

• Abstract In this paper, helium (He) ion irradiations with various fluences were performed on sputtered Cu thin films with a mosaic structure to evolve biaxial stress. X-ray diffraction of the 2 method was used to determine the residual strains in the thin films by measuring the spacing of the crystallographic planes. The results show the in-plane biaxial tensile stress has been reduced by ion irradiation. A new proposed model is discussed to explain the ion-irradiation-induced stress release in mosaic structured Cu thin films.

authors

• Nastasi, Michael

published proceedings

• Journal of Physics D

author list (cited authors)

• Fu, E. G., Wang, Y. Q., & Nastasi, M.

citation count

• 11

complete list of authors

• Fu, EG||Wang, YQ||Nastasi, M

publication date

• December 2012

publisher

• IOP Publishing  Publisher

published in

• Journal of Physics D: Applied Physics  Journal

keywords

• 40 Engineering
• 4016 Materials Engineering

Digital Object Identifier (DOI)

• 10.1088/0022-3727/45/49/495303

start page

• 495303

end page

• 495303

volume

• 45

issue

• 49

URL

• http://dx.doi.org/10.1088/0022-3727/45/49/495303