AbstractModern technology depends on materials with precisely controlled properties. Ion beams are a favored method (and in integrated circuit technology, the prime method) to achieve controlled modification of surfaces and nearsurface regions. In every integrated circuit production line there are ion implantation systems. In addition to integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metals, intermetallics, and ceramics without altering their bulk properties. This article reviews the fundamental of ionsolid interactions so that the reader will be able to understand the basic phenomena that occur when an energetic ion is implanted into a solid. The role of ion implantation in todays modern technology is explored.
