Sputter Deposition and Characterization of MoSi2/SiC Composite Coatings
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We have deposited layered structures of MoSi2/SiC composite coatings on different substrates by using a sputtering technique. SiC was used for a constituent of this structure because of the thermodynamic stability of the MoSi2/SiC system. DC -magnetron and rf -diode systems were used to sputter MoSi2 and SiC, respectively. The substrates were mounted on a rotating holder allowing successive deposition of MoSi2 and SiC layers. The total number of sublayers of each kind was 90. The thickness of the MoSi2 sublayers was 10 nm and that of the SiC 3 nm.