Orientation dependence of blistering in H-implanted Si
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Journal of Applied Physics
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Zheng, Y., Lau, S. S., Hchbauer, T., Misra, A., Verda, R., He, X., Nastasi, M., & Mayer, J. W.
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Zheng, Y||Lau, SS||Höchbauer, T||Misra, A||Verda, R||He, X-M||Nastasi, M||Mayer, JW
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http://dx.doi.org/10.1063/1.1334921