Formation of nanoporous noble metal thin films by electrochemical dealloying of PtxSi1x Academic Article uri icon

abstract

  • We demonstrate the synthesis of nanoporous Pt thin films on Si by electrochemical dealloying. Amorphous PtxSi1x films (100250nm thick) are formed by electron beam codeposition and dealloyed in aqueous HF solutions at an electrochemical potential sufficient to selectively remove Si while allowing self-assembly of Pt into a nanoporous structure. The Pt nanoporous layers have a pore size of 520nm, ligament thickness 5nm, a surface area enhancements <20 times, and an ultrafine grain polycrystalline microstructure.

published proceedings

  • Applied Physics Letters

author list (cited authors)

  • Thorp, J. C., Sieradzki, K., Tang, L., Crozier, P. A., Misra, A., Nastasi, M., Mitlin, D., & Picraux, S. T.

citation count

  • 132

publication date

  • January 2006