The intermetallic compound, MoSi2, has a combination of interesting properties, ranging from a high melting point to superior high temperature oxidation and corrosion resistance, which makes it a potential candidate for high temperature structural applications. It was shown previously that the addition of nitrogen into MoSi2 forms MoSi2Nx (x:3-4). The new phase has a very high crystallization temperature (> 1000°C) and is thermally compatible with both Mo and MoSi2. As suggested by these results, the introduction of nitrogen into MoSi2 may cause significant changes in its properties, yet the role of nitrogen in influencing the structure and phase stability of MoSi2 is still not known. In this study, we have systematically investigated the evolution of structure in MoSi2 in the presence of different nitrogen contents and annealing conditions.
The system investigated is single phase MoSi2Nx. Films were prepared by sputter deposition using a planar magnetron MoSi2 target at a DC power of 100-200 W.