Sub-15 nm nanoimprint molds and pattern transfer Academic Article

authors

• Williams, R. Stanley

published proceedings

• JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

altmetric score

• 3

author list (cited authors)

• Morecroft, D., Yang, J., Schuster, S., Berggren, K. K., Xia, Q., Wu, W., & Williams, R. S.

citation count

• 40

complete list of authors

• Morecroft, Debbie||Yang, Joel KW||Schuster, S||Berggren, Karl K||Xia, Qiangfei||Wu, Wei||Williams, R Stanley

publication date

• January 2009

publisher

• American Vacuum Society  Publisher

published in

• Journal of Vacuum Science and Technology Part B: Nanotechnology and Microelectronics  Journal

keywords

• Electron Resists
• Nanolithography
• Soft Lithography

Digital Object Identifier (DOI)

• 10.1116/1.3264670

start page

• 2837

end page

• 2840

volume

• 27

issue

• 6

URL

• http://dx.doi.org/10.1116/1.3264670