Fabrication of Multi-bit Crossbar Circuits at Sub-50 nm Half-pitch by Using UV-based Nanoimprint Lithography Academic Article

authors

• Williams, R. Stanley

published proceedings

• Journal of Photopolymer Science and Technology

author list (cited authors)

• Young, G., Wu, W., Lee, H., Wang, S. Y., Tong, W. M., & Williams, R. S.

citation count

• 3

complete list of authors

• Young, Gun||Wu, Wei||Lee, Heon||Wang, SY||Tong, William M||Williams, R Stanley

publication date

• January 2005

publisher

• Technical Association of Photopolymers, Japan  Publisher

published in

• Journal of Photopolymer Science and Technology  Journal

keywords

• Crossbar
• Drop Method
• Lithography
• Nanoimprint
• Uv Process

Digital Object Identifier (DOI)

• 10.2494/photopolymer.18.565

start page

• 565

end page

• 570

volume

• 18

issue

• 5