Fabrication of Multi-bit Crossbar Circuits at Sub-50 nm Half-pitch by Using UV-based Nanoimprint Lithography Academic Article uri icon

published proceedings

  • Journal of Photopolymer Science and Technology

author list (cited authors)

  • Young, G., Wu, W., Lee, H., Wang, S. Y., Tong, W. M., & Williams, R. S.

citation count

  • 3

complete list of authors

  • Young, Gun||Wu, Wei||Lee, Heon||Wang, SY||Tong, William M||Williams, R Stanley

publication date

  • January 2005