Fabrication of multi-bit crossbar circuits at sub-50 nm half-pitch by using UV-based nanoimprint lithography Academic Article

authors

• Williams, R. Stanley

published proceedings

• JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

author list (cited authors)

• Jung, G. Y., Wu, W., Lee, H., Wang, S. Y., Tong, W. M., & Williams, R. S.

citation count

• 3

complete list of authors

• Jung, GY||Wu, W||Lee, H||Wang, SY||Tong, WM||Williams, RS

publication date

• January 2005

publisher

• Technical Association of Photopolymers, Japan  Publisher

published in

• Journal of photopolymer science and technology = [Fotoporima Konwakai shi]  Journal

keywords

• Crossbar
• Drop Method
• Lithography
• Nanoimprint
• Uv Process

Digital Object Identifier (DOI)

• 10.2494/photopolymer.18.565

start page

• 565

end page

• 570

volume

• 18

issue

• 5

URL

• http://dx.doi.org/10.2494/photopolymer.18.565