Fabrication of Multi-bit Crossbar Circuits at Sub-50 nm Half-pitch by Using UV-based Nanoimprint Lithography
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Overview
published proceedings
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Journal of Photopolymer Science and Technology
author list (cited authors)
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Young, G., Wu, W., Lee, H., Wang, S. Y., Tong, W. M., & Williams, R. S.
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Young, Gun||Wu, Wei||Lee, Heon||Wang, SY||Tong, William M||Williams, R Stanley
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keywords
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Crossbar
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Drop Method
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Lithography
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Nanoimprint
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Uv Process
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Digital Object Identifier (DOI)
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