Issues on nanoimprint lithography with a single-layer resist structure
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APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
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Jung, G. Y., Wu, W., Ganapathiappan, S., Ohlberg, D., Islam, M. S., Li, X., ... Williams, R. S.
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Jung, GY||Wu, W||Ganapathiappan, S||Ohlberg, DAA||Islam, MS||Li, X||Olynick, DL||Lee, H||Chen, Y||Wang, SY||Tong, WM||Williams, RS
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