CHEMICAL VAPOR-DEPOSITION OF COGA AND PTGA2 THIN-FILMS FROM MIXED-METALORGANOMETALLIC COMPOUNDS Academic Article uri icon

abstract

  • A new process for deposition of thin metal films from organometallic precursors of limited volatility has been demonstrated. Short path vapor transport of the complexes dichloro(tetracarbonylcobalt)gallium(III) tetrahydrofuranate, (CO)4CoGaCl2(THF), or platinum(bis-dimethylglyoximato)(bis-dimethylgallium), Pt{(N2C2(CH3)2O2)(GaMe2)}2, each under a stream of hydrogen, leads to the films of the intermetallic compounds CoGa and PtGa2, respectively, on substrates such as Si(100) wafer or a glass slide at 500C. The compounds were identified and characterized by x-ray diffraction, Auger electron and x-ray photoelectron spectroscopies. The films are crystalline and highly reflective. The CoGa film is single phased; the PtGa2 film shows a minor constituent of Pt2Ga3.

published proceedings

  • APPLIED PHYSICS LETTERS

author list (cited authors)

  • CHEN, Y. J., KAESZ, H. D., KIM, Y. K., MULLER, H. J., WILLIAMS, R. S., & XUE, Z. L.

citation count

  • 40

publication date

  • December 1989