Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography
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Overview
author list (cited authors)
- Jung, G. Y., Ganapathiappan, S., Ohlberg, D., Olynick, D. L., Chen, Y., Tong, W. M., & Williams, R. S.
publication date
- January 1, 2004 11:11 AM
publisher
- American Chemical Society (ACS) Publisher
published in
- Nano Lett Journal