Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography
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Jung, G. Y., Ganapathiappan, S., Ohlberg, D., Olynick, D. L., Chen, Y., Tong, W. M., & Williams, R. S.
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Jung, GY||Ganapathiappan, S||Ohlberg, Douglas AA||Olynick, Deirdre L||Chen, Y||Tong, William M||Williams, R Stanley
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