Fabrication of a 34 x 34 crossbar structure at 50 nm half-pitch by UV-based nanoimprint lithography
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Jung, G. Y., Ganapathiappan, S., Ohlberg, D., Olynick, D. L., Chen, Y., Tong, W. M., & Williams, R. S.
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Jung, GY||Ganapathiappan, S||Ohlberg, DAA||Olynick, DL||Chen, Y||Tong, WM||Williams, RS
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