Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch. Academic Article uri icon


  • This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O(2) plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography.

published proceedings

  • Nano Lett

altmetric score

  • 3

author list (cited authors)

  • Ge, H., Wu, W., Li, Z., Jung, G., Olynick, D., Chen, Y., ... Williams, R. S.

citation count

  • 65

complete list of authors

  • Ge, Haixiong||Wu, Wei||Li, Zhiyong||Jung, Gun-Young||Olynick, Deirdre||Chen, Yanfeng||Liddle, J Alexander||Wang, Shih-Yuan||Williams, R Stanley

publication date

  • January 2005