Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch.
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This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O(2) plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography.
author list (cited authors)
Ge, H., Wu, W., Li, Z., Jung, G., Olynick, D., Chen, Y., ... Williams, R. S.
complete list of authors
Ge, Haixiong||Wu, Wei||Li, Zhiyong||Jung, Gun-Young||Olynick, Deirdre||Chen, Yanfeng||Liddle, J Alexander||Wang, Shih-Yuan||Williams, R Stanley