Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch. Academic Article

abstract

• This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O(2) plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography.

authors

• Williams, R. Stanley

published proceedings

• Nano Lett

altmetric score

• 3

author list (cited authors)

• Ge, H., Wu, W., Li, Z., Jung, G., Olynick, D., Chen, Y., ... Williams, R. S.

citation count

• 65

complete list of authors

• Ge, Haixiong||Wu, Wei||Li, Zhiyong||Jung, Gun-Young||Olynick, Deirdre||Chen, Yanfeng||Liddle, J Alexander||Wang, Shih-Yuan||Williams, R Stanley

publication date

• January 2005

publisher

• American Chemical Society (ACS)  Publisher

published in

• Nano Letters: a journal dedicated to nanoscience and nanotechnology  Journal

keywords

• 0912 Materials Engineering

PubMed Central ID

• 15792435

Digital Object Identifier (DOI)

• 10.1021/nl048618k

start page

• 179

end page

• 182

volume

• 5

issue

• 1

URL

• http://dx.doi.org/10.1021/nl048618k