Plasma-induced formation of Ag nanodots for ultra-high-enhancement surface-enhanced Raman scattering substrates.
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We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20-60 nm) and redeposited Ag nanodots ( approximately 10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering.
author list (cited authors)
Li, Z., Tong, W. M., Stickle, W. F., Neiman, D. L., Williams, R. S., Hunter, L. L., ... Brueck, S.
complete list of authors
Li, Zhiyong||Tong, William M||Stickle, William F||Neiman, David L||Williams, R Stanley||Hunter, Luke L||Talin, A Alec||Li, D||Brueck, SRJ