LASER-ASSISTED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION OF FILMS OF RHODIUM AND IRIDIUM Academic Article uri icon

abstract

  • High purity (less than 1% carbon) thin films of rhodium and iridium metal have been obtained by laser-assisted organometallic chemical vapor deposition. Gaseous (5-C5H5)M(C2H4)2 (M=Rh,Ir) was the organometallic precursor. Depositions were carried out in an atmosphere of He and H2 at room temperature and atmospheric pressure. Wavelength dependence studies of the rhodium precursor have shown that only irradiation into the compounds charge transfer band causes deposition. Deposits can also be obtained thermally. The films were analyzed by x-ray diffraction and x-ray photoelectron spectroscopy.

published proceedings

  • APPLIED PHYSICS LETTERS

altmetric score

  • 3

author list (cited authors)

  • COHAN, J. S., YUAN, H., WILLIAMS, R. S., & ZINK, J. I.

citation count

  • 18

publication date

  • March 1992