Hybrid nanoimprint-soft lithography with sub-15 nm resolution. Academic Article

abstract

• We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 microm diameter.

authors

• Williams, R. Stanley

published proceedings

• Nano Lett

author list (cited authors)

• Li, Z., Gu, Y., Wang, L., Ge, H., Wu, W., Xia, Q., ... Williams, R. S.

citation count

• 142

complete list of authors

• Li, Zhiwei||Gu, Yanni||Wang, Lei||Ge, Haixiong||Wu, Wei||Xia, Qiangfei||Yuan, Changsheng||Chen, Yanfeng||Cui, Bo||Williams, R Stanley

publication date

• June 2009

publisher

• American Chemical Society (ACS)  Publisher

published in

• Nano Letters: a journal dedicated to nanoscience and nanotechnology  Journal

keywords

• Bioengineering

PubMed Central ID

• 19422192

Digital Object Identifier (DOI)

• 10.1021/nl9004892

start page

• 2306

end page

• 2310

volume

• 9

issue

• 6

URL

• http://dx.doi.org/10.1021/nl9004892