Annealing of chemically vapor deposited nanoscale Ti-Si islands on Si Academic Article

authors

• Williams, R. Stanley

published proceedings

• APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

author list (cited authors)

• Kamins, T. I., Williams, R. S., & Ohlberg, D.

citation count

• 1

complete list of authors

• Kamins, TI||Williams, RS||Ohlberg, DAA

publication date

• March 2005

publisher

• Springer Nature  Publisher

published in

• Applied Physics A: materials science and processing  Journal

Digital Object Identifier (DOI)

• 10.1007/s00339-004-3156-2

start page

• 1279

end page

• 1286

volume

• 80

issue

• 6

URL

• http://dx.doi.org/10.1007/s00339-004-3156-2